ICPMS-2040 / ICPMS-2050 Series

Inductively Coupled Plasma Mass Spectrometry

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ICPMS-2040 / ICPMS-2050 ICPMS System          
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Fast, sensitive ICP mass spectrometers for reliable data analysis

Increase throughput and boost analytical accuracy

ICPMS-2040 and ICPMS-2050 systems are designed for speed and accuracy. With their high-speed cell gas purging and ProActive rinsing features, you can reduce measurement time by 30% compared to other instruments. And their sensitive mini-torch systems help you capture the accurate data you need.

These systems also feature an intuitive software package for easy operation. You can view all necessary information in a single window for quick analysis. The software also has automatic alerts for maintenance tasks to simplify upkeep.

Key Features

Key features of the ICPMS-2040 / ICPMS-2050 Series Inductively Coupled Plasma Mass Spectrometry
  • ProActive Rinsing feature saves time during measurement
  • Preset analytical methods for easy operation
  • Easy-to-access plasma stand for quick maintenance
  • Charge Stabilizer ensures long-term signal stability
  • Extended rinsing automatically minimizes carryover
  • Intuitive LabSolutions ICPMS software simplifies analysis

Advanced mini-torch system improves ionization efficiency and sensitivity

  • Proprietary design helps you improve accuracy

    The new mini-torch design of ICPMS-2040/2050 systems improves the accuracy of your data. The torch is twice as sensitive as previous systems – decreasing sample flow rate into the plasma, improving sample ionization efficiency and providing you with more reliable data.

  • Advanced mini-torch system improves sensitivity and ionization efficiency
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Efficient, sustainable design reduces argon gas consumption

  • Efficient, sustainable design reduces argon gas consumption

  • Stop wasting money on high argon consumption

    The mini torch on ICPMS-2040/2050 systems consumes only 11 L/min of argon – two-thirds the amount used by traditional plasma torches. Continuous operation using a 7 m3 gas cylinder is up to 10 hours. And by using Eco mode on standby, you can cut argon use to just 5.5 L/min plasma.

    With the ICPMS-2040/2050 system, there is also no need for high purity argon gas. You can use low-purity (99.95 %) argon gas to reliably generate a robust plasma – further reducing your costs.

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High-speed gas controller saves time and increases throughput

  • Get the performance you need with no extra cost

    With the high-speed gas control features of ICPMS-2040/2050 systems, you can save time and increase throughput. The gas controller reduces cell gas introduction and exhaust times. When combined with the ProActive rinsing feature, the gas controller can reduce the time you spend on measurements by 30% compared with competitive systems – without the need for additional accessories or cost. This feature enables you to spend less time on measurements and perform faster sample analysis. High throughput also means reduction in power, argon consumption, wear of consumables, and eventually operating costs.

  • High-speed gas controller saves time and increases throughput
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Featured Content

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Videos

  • ICPMS-2040/2050 series

    Shimadzu’s ICPMS-2040 Series / ICPMS-2050 Series of ICP Mass Spectrometers has achieved a harmonious blend of environmental-friendliness and analytical performance through its advanced proprietary Mini-Torch System. Without the need for any special options, it reduces measurement time, contributing to the optimization of your workflow efficiency in trace element analysis.
    Moreover, the software comes with various functions, options, and maintenance information that minimize operator intervention, revolutionizing the way you work.

  • How to Clean ICP-MS Glassware and Cones

    • Inductively Coupled Plasma Mass Spectrometry

    Shimadzu's ICP-MS is a robust system that only requires minor routine inspection and cleaning. With ICP-MS systems, all glassware and interface cones should be regularly inspected and cleaned if needed. In addition, the cleaning frequency of the instrument varies by sample matrices and workload. In this video, we will show how to clean and maintain the glassware and cones of Shimadzu’s ICP-MS instrument.

  • Extended Rinsing, Inductively Coupled Plasma Mass Spectrometry ICPMS-2040/2050

    • Elemental Analysis

    "Extended Rinsing" function, one of the features of ICPMS-2040/2050 is introduced here.
    The extended rinsing function automatically performs an additional rinse sequence when a target element exceeds a predetermined upper limit. A second rinse solution can be used in the additional rinsing sequence to improve rinsing effectiveness. Consequently, carryover is eliminated to ensure high-quality data.

  • ProActive Rinsing, Inductively Coupled Plasma Mass Spectrometry ICPMS-2040/2050

    • Elemental Analysis

    "ProActive Rinsing" function, one of the features of ICPMS-2040/2050 is introduced here.
    ProActive Rinsing can shorten the analysis time by sharting the rinsing sequence in advance. While measuring multiple samples, the rinsing sequence can be started early by sending the autosampler probe to rinse while collecting data using sample already in the suction line. This greatly reduces measurement time and conserves sample.

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