The secondary-electron image resolution of 3 nm (30 kV accelerating voltage) is the highest level for an EPMA system. This is the ultimate secondary-electron image resolution under analysis conditions.
EPMA-8050G
Electron Probe Microanalyzer
A cutting-edge FE electron optical system provides the ultimate in advanced EPMA analysis performance
This instrument is equipped with a cutting-edge FE electron optical system, which provides unprecedented spatial resolution under all beam current conditions, from SEM observation conditions up to 1 μA order. Integration with high performance X-ray spectrometers that Shimadzu has fostered through the company's traditions achieves the ultimate advance in analysis performance.
Features
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This system achieves a maximum beam current of 3.0 μA (30 kV accelerating voltage). There is no need to replace the objective aperture across the entire beam current range. -
The 52.5° X-ray take-off angle is in a class by itself. The 4-inch Rowland circle radius provides both high sensitivity and high resolution. The system can accommodate up to five X-ray spectrometers of the same type. -
Advanced operability ensures that all operations can be performed with just a mouse. The user interface is designed to be easy to understand. Easy mode analysis automates all processes up to generating reports. -
A high output Schottky emitter with a larger tip diameter than ordinarily used in SEMs is adopted for the FE electron gun. A stable electron beam is obtained that while bright has the large current indispensable for high sensitivity analysis.
